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Sandblasting dry film resist and liquid resist patterning equipment

Laminator

For thin fragile materials

By tables feeding system, fragile materials, such as crystal, glass, silicon wafer, etc can be laminated without damages.

From one dry film, no waste of dry film

Dry film is severed and laminated automatically without washing it.


ELM-350

Exposer

Film mask, glass mask available to use

Both glass mask and film mask available to use as pattern masking

Exposing 30μm pattern available

Precise exposure available by high precision rod integrator and collimation mirror


EE-350H

High Pressure mist type developer for precision

Precise patterning and high aspect ratio development available

Swelling of dry film restrained and fine pattern of developer available due to the misted developer jetting

Alkaline developer and organic solvent developer available

Alkaline developer for dry film resist sandblasting

Organic solvent developer for liquid resist sandblasting


EWB-1SP

Liquid resist spin coaterLiquid resist spin coatervvvv

Liquid resist coating and  overcoating

constant layer application for liquid resist and overcoating by centrifugal force

Coating parameter adjustable thru touch panel

table rotation time and coating time etc input thru touch panel


ESC-1

サンドブラスト微細パターン加工プロセス




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