Sandblasting dry film resist and liquid resist patterning equipment
Laminator |
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・For thin fragile materialsBy tables feeding system, fragile materials, such as crystal, glass, silicon wafer, etc can be laminated without damages. ・From one dry film, no waste of dry filmDry film is severed and laminated automatically without washing it. |
ELM-350 |
Exposer |
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・Film mask, glass mask available to useBoth glass mask and film mask available to use as pattern masking ・Exposing 30μm pattern availablePrecise exposure available by high precision rod integrator and collimation mirror |
EE-350H |
High Pressure mist type developer for precision |
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・Precise patterning and high aspect ratio development availableSwelling of dry film restrained and fine pattern of developer available due to the misted developer jetting ・Alkaline developer and organic solvent developer availableAlkaline developer for dry film resist sandblasting Organic solvent developer for liquid resist sandblasting |
EWB-1SP |
Liquid resist spin coaterLiquid resist spin coatervvvv |
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・Liquid resist coating and overcoatingconstant layer application for liquid resist and overcoating by centrifugal force ・Coating parameter adjustable thru touch paneltable rotation time and coating time etc input thru touch panel |
ESC-1 |
サンドブラスト微細パターン加工プロセス |
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装置、加工についてのご相談 TEL:052-758-1102 FAX:052-758-1103 または こちらへお問合せください。 |