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Sample of Elfo Mist Jetting

Examples of processing development of dry film resist for etching (for electroformed)

Film thickness25μm  Width of line10μm Space10μ
Film thickness25μm  Width of line8μm Space8μ
Film thickness112μm Width of line25μm Space25μ
Film thickness112μm Width of line130μm Space30μ
Please order for minute trial manufacture processing.

Consultation of device and processing

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