Sample of Elfo Mist Jetting
Examples of processing development of dry film resist for etching (for electroformed) |
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 Film thickness25μｍ Width of line10μｍ Space10μｍ |
 Film thickness25μｍ Width of line8μｍ Space8μｍ |
 Film thickness112μｍ Width of line25μｍ Space25μｍ |
 Film thickness112μｍ Width of line130μｍ Space30μｍ |
 Please order for minute trial manufacture processing.
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Consultation of device and processing TEL:052-758-1102 FAX:052-758-1103 Please inquire of Here |
