Photoresist development

During the photoresist developing process, the microscopic pattern formation cannot be made due to the pattern swelling with saturated developer liquid at the exposed area in the past. Elfo Mist Jetting can develop the microscopic pattern by small amount developer mist with high pressure jetting thru the mist jetting nozzles , minimizing the swelling of the photoresist.

・Development of dry film resist for wet etching process or electroformed (plating) process

・Development of film for sandblasting process

・Development of dry film resist for wet etching process or electroformed (plating) process

Comparing with the conventional screen pattern developer equipment, Elfo mist jetting can develop finer pattern screen printing minimizing water consumption less than 1/10 and less skirt shape pattern.

・Liquid type photo resist developer for sandblasting process

The developer of the organic solvent system (No flash point with mixing water) can be made to the high-pressure mist, be developed, and the resist layer for the sandblasting process that the Sandblast tolerance is high and minute be formed.

・Other photopolymer material developer

More refined pattern than the past development can be formed with the pattern formations of the photosensitive materials such as the electrode materials and the photosensitive polyimide.  

Please order an experimental processing.

Consultation of device and processing